In collaboration with Prof. Dunhui Wang’s group in our physical department, we published a paper entitled “Observation of topological Hall effect in antiferromagnetic FeRh film”in APL [Applied Physical Letters 115, 022404 (2019)]. Noncollinear magnetic structures can give rise to peculiar Hall effects and hold promise for next-generation spintronic devices. In this work, we report the observation of the topological Hall effect (THE) through electrical transport measurements in antiferromagnetic B2-ordered FeRh thin films grown by sputtering techniques on a MgO (001) substrate. Our results opens the possibility to discover the topological Hall effect in centrosymmetric antiferromagnets in contrast to the widely reported B20-type chiral magnets.